|
KMID : 0364920180430040131
|
|
Journal of Radiation Protection and Research
2018 Volume.43 No. 4 p.131 ~ p.136
|
|
|
Influence of the Thin-Film Ag Electrode Deposition Thickness on the Current Characteristics of a CVD Diamond Radiation Detector
|
|
Ban Chae-Min
Lee Chul-Yong
Jun Byung-Hyuk
|
|
|
Abstract
|
|
|
Background: We investigated the current characteristics of a thin-film Ag electrode on a chemical vapor deposition (CVD) diamond. The CVD diamond is widely recognized as a radiation detection material because of its high tolerance against high radiation, stable response to various dose rates, and good sensitivity. Additionally, thin-film Ag has been widely used as an electrode with high electrical conductivity.
Materials and Methods: Considering these properties, the thin-film Ag electrode was deposited onto CVD diamonds with varied deposition thicknesses (≒50/98/152/257 nm); subsequently, the surface thickness, surface roughness, leakage current, and photo-current were characterized.
Results and Discussion: The leakage current was found to be very low, and the photo-current output signal was observed as stable for a deposited film thickness of 98 nm; at this thickness, a uniform and constant surface roughness of the deposited thin-film Ag electrode were obtained.
Conclusion: We found that a CVD diamond radiation detector with a thin-film Ag electrode deposition thickness close to 100 nm exhibited minimal leakage current and yielded a highly stable output signal.
|
|
|
KEYWORD
|
|
|
CVD diamond, Radiation detector, Thin-film Ag electrode, Leakage current, Photo-current
|
|
|
FullTexts / Linksout information
|
|
|
|
|
|
Listed journal information
|
|
|
|